Generate ASCII Job files for an ASML PAS 5500 Stepper Lithography system, by the UCSB Nanofabrication Facility.
Updates to work after LIPC Software Upgrade.
Published by demisjohn over 2 years ago
Minor documentation additions and version bump. Includes some docstring text on setting up Defaults.py
to work with your own ASML machine.
Published by demisjohn over 2 years ago
Includes new functions to find valid cells on-wafer (preventing job conversion errors).
Now can automatically populate wafer with die. Thanks to Miguel Daal for the code.
Published by demisjohn over 4 years ago
Minor updates to plot_reticles()
for clarity.
Published by demisjohn over 4 years ago
This release can plot the Wafer including alignment marks, and plot reticles, with new commands Job.Plot.plot_wafer()
and Job.Plot.plot_reticles()
.
Plotting options can be found in Defaults.py
.
plot_reticles()
:
plot_wafer()
:
Published by demisjohn over 4 years ago
This release enables the following:
The new "Example02" file has been tested by exposing a wafer on our system, and performing 2nd layer alignment/exposure.
Published by demisjohn over 4 years ago
Now can generate wafer layout preview, like so:
Plotting command added to Example01.
Published by demisjohn almost 5 years ago
Uncovered and fixed bugs when jobs were converted and executed for exposure on an ASML PAS 5500/300 stepper system. This release is confirmed to produce good exposures on the stepper and has been tested on jobs requiring complex stitching.
This release supports multiple Layers and multiple Images per layer with arbitrary wafer placement, but does not yet support alignment, alignment mark exposure or optical prealignment. (See branch AlignmentDev
for progress on Alignment.)
Published by demisjohn almost 5 years ago
Exports working and tested without alignment. Alignment classes are written but untested.